深圳大学“柔性可拉伸电子”方向招聘青年教师及博士后; 深圳大学光电子器件与系统教育部重点实验室拟招聘博士后研究人员1-2名; 深圳大学光电工程学院“光子技术与器件”研究方向博士后招聘; 深圳大学光电子器件与系统教育部重点实验室,国家“青年千人”获得者、深圳大学特聘教授王科拟招聘博士后研究人员1-2名;

李佳

发表于 2015-05-26 18:30


李佳,博士,讲师。2008年和2010年毕业于哈尔滨工业大学,分别获得工学学士和工学硕士学位,2014年毕业于香港大学,获得哲学博士学位。2015年5月入职深圳大学光电工程学院,主要从事计算光刻,X射线相衬成像等领域的研究工作。

联系方式
电话:0755-26733319
邮箱:jli@szu.edu.cn

期刊论文
1. Jia Li and Edmund Y. Lam, ``Robust Source and Mask Optimization Compensating for Mask Topography Effects in Computational Lithography,’’ Optics Express, vol. 22, no. 8, pp. 9471—9485, April 2014.
2. Xiaofei Wu, Shiyuan Liu, Jia Li, and Edmund Y. Lam, ``Efficient Source Mask Optimization with Zernike Polynomial Functions for Source Representation,’’ Optics Express, vol. 22, no. 4, pp. 3924—3937, February 2014. 
3. Jia Li, Shiyuan Liu, and Edmund Y. Lam, ``Efficient Source and Mask Optimization with Augmented Lagrangian Methods in Optical Lithography,’’ Optics Express, vol. 21, no. 7, pp. 8076—8090, April 2013. 
4. Jia Li, Yijiang Shen, and Edmund Y. Lam, ``Hotspot-aware Fast Source and Mask Optimization,’’ Optics Express, vol. 20, no. 19, pp. 21792—21804, September 2012. 

参加会议
1. Jia Li and Edmund Y. Lam, ``Joint Optimization of Source, Mask, and Pupil in Optical Lithography,’’ in Advanced Lithography, vol. 9052 of Proceedings of the SPIE, pp. 90520S, February 2014. (Best Student Paper Award Candidate)
2. Jia Li, Shiyuan Liu, and Edmund Y. Lam, ``Efficient Source and Mask Optimization with Augmented Lagrangian Methods in Optical Lithography,’’ in 11th Fraunhofer IISB Lithography Simulation Workshop, September 2013. (Invited Talk)
3. Xiaofei Wu, Shiyuan Liu, Jia Li, and Edmund Y. Lam, ``Efficient Source Mask Optimization with Zernike Polynomial Function-based Source Representation,’’ in OSA Meeting on Nanophotonics, Nanoelectronics and Nanosensors, pp. NSa3A. 15, May 2013.
4. Jia Li and Edmund Y. Lam, ``Efficient Mask Synthesis with Augmented Lagrangian Methods in Computational Lithography,’’ in China Semiconductor Technology International Conference (CSTIC), March 2013. Published in ECS Transactions, vol. 52, no. 1, pp. 163—168. (Invited Paper)
5. Jia Li, Ningning Jia, and Edmund Y. Lam, ``Hotspot-aware Robust Mask Design with Inverse Lithography,’’ in China Semiconductor Technology International Conference (CSTIC), March 2012. Published in ECS Transactions, vol. 44, no. 1, pp. 197—202. (Best Student Paper Award Candidate)




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